EUV Pellicles Ready For Fabs, Expected to Boost Chip Yields and Sizes
Foundries started limited usage of extreme ultraviolet (EUV) lithography for high-volume manufacturing (HVM) of chips in 2019. At the time, ASML's Twinscan NXE scanners were good enough for production, but the full EUV ecosystem was not quite there. One of the things that impacted EUV was the lack of protective pellicles for photomasks, which limited usage of EUV tools and affected yields. Fortunately, the situation with pellicles has finally improved thanks to the recent introduction of production-ready EUV pellicles, and matters promise to get even better in the coming years.
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